Indian Institute of Technology Delhi
Industrial Research & Development Unit
Advertisement No.: I1TD/IRD/82/2012
Applications are invited from Indian Citizens for adhoc appointment as per details mentioned below for a maximum period of six months or upto the duration of the project, whichever is earlier.
Research Associate
Title of the Project: Non-Silicon Based Technologies for Nanofabrication and Nanoscale Devices (RP02395)
Duration of the Project: Upto 8/8/2015
Funding Agency: DIT
Pay Scale : Rs. 22,000-23,000-24,000/- per month + HRA 3% (as per rules)
Educational Qualification:
- Essential: PhD (Porous Structures) with First Class M.Sc or equivalent in Chemistry and a minimum of 2 1/2 years of relevant experience after Ph.D
Interview:
Date of Interview: 22/03/2012 | Time: 3:00 pm
Venue: Committee Room (Room No. 325)
Centre for Atmospheric Sciences (CAS),
II Floor, Block-VI, IIT Delhi.
Centre for Atmospheric Sciences (CAS),
II Floor, Block-VI, IIT Delhi.
How To Apply:
The candidates who fulfill the above qualifications / experience should appear for the interview. Kindly bring your formal application through proper channel along with Bio-data with complete information regarding educational qualifications indicating percentage of marks of each examination passed, details of work experience and a recent passport size photograph, along with photocopies certificates (both academic & professional) addressed to the Assistant Registrar (IRD), IIT Delhi, Hauz Khas, New Delhi -110016 on the date of interview. The advertisement No., Title of Project and Post applied for must be mentioned on top left side of the application.
Address: Assistant Registrar (IRD),
IIT Delhi, Hauz Khas, New Delhi -110016
IIT Delhi, Hauz Khas, New Delhi -110016
Website: http://www.iitd.ac.in
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